"Asad" wrote in message
oups.com...
HI,

How can I perform doping of silicon manually?

Asad


You need either a particle accelerator or an extremely deadly gas (Arsine,
Phosphine or Di-borine depending on you dopant type). Once the dopant is on
the surface of the wafer you will need to activate the dopant with a high
temp furnace (typically a drive-in is done at 950C-1100C). If you used the
particle accelerator you will need to aneal the wafer to restore the smooth
surface. If you only want to dope certain sections of the wafer then you
will need a lithography system. You should be able to pick up used equipment
for about $1million US. Or you can hire a fab to do the work for you.

Also, you will get a better response from sci.engr.semiconductors.

Dwayne